High-Resolution Images with low NA Objectives, using Coherent Illumination

Christian Schwarz
Optical Sciences and Engineering
University of New Mexico

The push in semiconductor lithography towards smaller and smaller printed features has revived the search for sub-wavelength resolution imaging. Part of this work spills over into general areas of microscopy. In our group, led by S.R.J. Brueck at CHTM, we investigated a principle we called imaging interferometric lithography (IIL) or microscopy (IIM), respectively. I will explain the principles and show some of the work. Also, I want to report from the OSA annual meeting where I had been to represent our local student chapter. Students, foremost new ones, interested in OSA and its benefits and work are especially welcome.

12:00 p.m., Friday, October 26, 2001

A light lunch will immediately follow the talk.

Room 103, Center for High Technology Materials
1313 Goddard SE, Albuquerque NM 87106